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Fin structure formation by selective etching |
Hua Chung |
2016-12-27 |
| 9508831 |
Method for fabricating vertically stacked nanowires for semiconductor applications |
Hua Chung |
2016-11-29 |
| 9478433 |
Cyclic spacer etching process with improved profile control |
Qingjun Zhou, Jungmin Ko, Tom Choi, Sean S. Kang, Jeremiah T. Pender +1 more |
2016-10-25 |
| 9431266 |
Double patterning method |
Kangguo Cheng, Bruce B. Doris, Ali Khakifirooz |
2016-08-30 |
| 9431252 |
Tunneling field effect transistor (TFET) formed by asymmetric ion implantation and method of making same |
— |
2016-08-30 |
| 9419107 |
Method for fabricating vertically stacked nanowires for semiconductor applications |
Hua Chung |
2016-08-16 |
| 9412603 |
Trimming silicon fin width through oxidation and etch |
Hua Chung |
2016-08-09 |
| 9401310 |
Method to form trench structure for replacement channel growth |
Hua Chung |
2016-07-26 |
| 9373546 |
Self aligned replacement Fin formation |
Hua Chung |
2016-06-21 |
| 9343354 |
Middle of line structures and methods for fabrication |
Qinghuang Lin |
2016-05-17 |
| 9287386 |
Method for fabricating vertically stacked nanowires for semiconductor applications |
Hua Chung |
2016-03-15 |
| 9269634 |
Self-aligned metal gate CMOS with metal base layer and dummy gate structure |
Kangguo Cheng, Bruce B. Doris |
2016-02-23 |
| 9252250 |
Tunneling field effect transistor (TFET) with ultra shallow pockets formed by asymmetric ion implantation and method of making same |
— |
2016-02-02 |
| 9252023 |
Etching method and apparatus |
Shih-Hung Chen, Chien-An Chen, Ying Xiao |
2016-02-02 |
| 9245791 |
Method for fabricating a contact |
Qinghuang Lin |
2016-01-26 |
