Issued Patents 2011
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8021823 | Positive resist composition, method of forming resist pattern, and polymeric compound | Hiroaki Shimizu, Tsuyoshi Nakamura, Daiju Shiono, Tomoyuki Hirano | 2011-09-20 |
| 7989138 | Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern | Sanae Furuya, Takayoshi Mori, Ryoichi Takasu, Tomoyuki Hirano | 2011-08-02 |
| 7960089 | Compound, method for producing same, positive resist composition and method for forming resist pattern | Daiju Shiono, Taku Hirayama, Kohei KASAI, Hideo Hada | 2011-06-14 |
| 7960091 | Resist composition and method of forming resist pattern | Hiroaki Shimizu, Tsuyoshi Nakamura | 2011-06-14 |
| 7919651 | Positive resist composition, method of forming resist pattern, polymeric compound, and compound | Daiju Shiono, Hiroaki Shimizu | 2011-04-05 |
| 7914967 | Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern | Sanae Furuya, Takayoshi Mori, Ryoichi Takasu, Tomoyuki Hirano | 2011-03-29 |