HH

Hideo Hada

TC Tokyo Ohka Kogyo Co.: 12 patents #1 of 105Top 1%
RI Riken: 2 patents #9 of 163Top 6%
HI Hitachi: 1 patents #961 of 2,733Top 40%
Overall (2011): #1,950 of 364,097Top 1%
13
Patents 2011

Issued Patents 2011

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
8025923 Method for manufacturing a structure Shigenori Fujikawa, Toyoki Kunitake, Hiromi Takaemoto, Mari Koizumi, Sanae Furuya 2011-09-27
8017300 Compound, positive resist composition and method for forming resist pattern Daiju Shiono, Taku Hirayama 2011-09-13
8012669 Resist composition and method of forming resist pattern Hiroaki Shimizu, Yasuhiro Yoshii, Yoshiyuki Utumi 2011-09-06
7993706 Method of forming a nano-structure and the nano-structure Shigenori Fujikawa, Toyoki Kunitake, Toshiyuki Ogata 2011-08-09
7960089 Compound, method for producing same, positive resist composition and method for forming resist pattern Daiju Shiono, Takahiro Dazai, Taku Hirayama, Kohei KASAI 2011-06-14
7943284 Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern Daiju Shiono, Taku Hirayama, Toshiyuki Ogata, Shogo Matsumaru 2011-05-17
7932013 Pattern coating material and pattern forming method Shogo Matsumaru, Toshiyuki Ogata, Kiyoshi Ishikawa, Shigenori Fujikawa, Toyoki Kunitake 2011-04-26
7927780 Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator Akiya Kawaue, Takeshi Iwai, Shinichi Hidesaka, Tsuyoshi Kurosawa, Natsuko Maruyama +4 more 2011-04-19
7910284 Materials for photoresist, photoresist composition and method of forming resist pattern Kyoko Kojima, Daiju Shiono 2011-03-22
7901865 Resist composition and process for formation of resist patterns Taku Hirayama, Daiju Shiono 2011-03-08
7897319 Positive resist composition and method of forming resist pattern Daiju Shiono, Taku Hirayama 2011-03-01
7879528 Resist composition for electron beam or EUV Takeo Watanabe, Hiroo Kinoshita 2011-02-01
7862981 Compound, positive resist composition and method of forming resist pattern Daiju Shiono, Taku Hirayama 2011-01-04