Issued Patents 2011
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8021823 | Positive resist composition, method of forming resist pattern, and polymeric compound | Hiroaki Shimizu, Tsuyoshi Nakamura, Takahiro Dazai, Tomoyuki Hirano | 2011-09-20 |
| 8017300 | Compound, positive resist composition and method for forming resist pattern | Taku Hirayama, Hideo Hada | 2011-09-13 |
| 7981588 | Negative resist composition and method of forming resist pattern | Takako Hirosaki, Taku Hirayama | 2011-07-19 |
| 7960089 | Compound, method for producing same, positive resist composition and method for forming resist pattern | Takahiro Dazai, Taku Hirayama, Kohei KASAI, Hideo Hada | 2011-06-14 |
| 7943284 | Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern | Taku Hirayama, Toshiyuki Ogata, Shogo Matsumaru, Hideo Hada | 2011-05-17 |
| 7923192 | Base material for pattern-forming material, positive resist composition and method of resist pattern formation | Taku Hirayama, Tasuku Matsumiya, Yohei Kinoshita | 2011-04-12 |
| 7919651 | Positive resist composition, method of forming resist pattern, polymeric compound, and compound | Takahiro Dazai, Hiroaki Shimizu | 2011-04-05 |
| 7910284 | Materials for photoresist, photoresist composition and method of forming resist pattern | Kyoko Kojima, Hideo Hada | 2011-03-22 |
| 7901865 | Resist composition and process for formation of resist patterns | Taku Hirayama, Hideo Hada | 2011-03-08 |
| 7897319 | Positive resist composition and method of forming resist pattern | Taku Hirayama, Hideo Hada | 2011-03-01 |
| 7862981 | Compound, positive resist composition and method of forming resist pattern | Taku Hirayama, Hideo Hada | 2011-01-04 |