Issued Patents 2011
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8058220 | Cleaning liquid for lithography and a cleaning method using it for photoexposure devices | Jun Koshiyama, Yoshihiro Sawada, Jiro Yokoya | 2011-11-15 |
| 8021823 | Positive resist composition, method of forming resist pattern, and polymeric compound | Hiroaki Shimizu, Tsuyoshi Nakamura, Takahiro Dazai, Daiju Shiono | 2011-09-20 |
| 7994603 | Semiconductor device and a method of manufacturing the same | Junli Wang, Toyotaka Kataoka, Yoshiya Hagimoto | 2011-08-09 |
| 7989138 | Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern | Sanae Furuya, Takahiro Dazai, Takayoshi Mori, Ryoichi Takasu | 2011-08-02 |
| 7968365 | Method for manufacturing solid-state imaging device | Susumu Hiyama | 2011-06-28 |
| 7914967 | Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern | Sanae Furuya, Takayoshi Mori, Takahiro Dazai, Ryoichi Takasu | 2011-03-29 |