Issued Patents 2011
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8058220 | Cleaning liquid for lithography and a cleaning method using it for photoexposure devices | Yoshihiro Sawada, Jiro Yokoya, Tomoyuki Hirano | 2011-11-15 |
| 7897325 | Lithographic rinse solution and method for forming patterned resist layer using the same | Yoshihiro Sawada, Kazumasa Wakiya, Atsushi Miyamoto, Hidekazu Tajima | 2011-03-01 |
| 7884062 | Cleaning liquid for lithography and cleaning method using same | Hideya Kobari | 2011-02-08 |