Issued Patents 2011
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7923192 | Base material for pattern-forming material, positive resist composition and method of resist pattern formation | Taku Hirayama, Daiju Shiono, Tasuku Matsumiya | 2011-04-12 |
| 7919227 | Positive resist composition and method of forming resist pattern | Takeshi Iwai, Toshiyuki Ogata | 2011-04-05 |