Issued Patents 2011
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8062828 | Positive resist composition and patterning process | Youichi Ohsawa, Masaki Ohashi, Seiichiro Tachibana, Takeru Watanabe, Jun Hatakeyama | 2011-11-22 |
| 8062831 | Carboxyl-containing lactone compound, polymer, resist composition, and patterning process | Satoshi Shinachi, Tsunehiro Nishi, Koji Hasegawa, Seiichiro Tachibana, Takeru Watanabe | 2011-11-22 |
| 8057985 | Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process | Masaki Ohashi, Youichi Ohsawa, Jun Hatakeyama, Seiichiro Tachibana | 2011-11-15 |
| 8057982 | Monomer, resist composition, and patterning process | Jun Hatakeyama, Masaki Ohashi, Kazuhiro Katayama | 2011-11-15 |
| 8053165 | Hydroxyl-containing monomer, polymer, resist composition, and patterning process | Masaki Ohashi, Koji Hasegawa, Takeru Watanabe | 2011-11-08 |
| 8053179 | Method for manufacturing substrate for making microarray | Wataru Kusaki, Toshinobu Ishihara | 2011-11-08 |
| 8048610 | Sulfonium salt-containing polymer, resist composition, and patterning process | Youichi Ohsawa, Jun Hatakeyama, Seiichiro Tachibana | 2011-11-01 |
| 8030515 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Katsuhiro Kobayashi, Youichi Ohsawa, Takeru Watanabe | 2011-10-04 |
| 8021822 | Positive resist compositions and patterning process | Youichi Ohsawa, Takeru Watanabe | 2011-09-20 |
| 8017302 | Positive resist compositions and patterning process | Youichi Ohsawa, Takeru Watanabe | 2011-09-13 |
| 7998657 | Ester compounds and their preparation, polymers, resist compositions and patterning process | Masaki Ohashi, Takeru Watanabe | 2011-08-16 |
| 7993811 | Positive resist compositions and patterning process | Youichi Ohsawa, Takeru Watanabe | 2011-08-09 |
| 7985528 | Positive resist composition and patterning process | Tsunehiro Nishi, Masaki Ohashi, Koji Hasegawa, Masashi Iio | 2011-07-26 |
| 7981589 | Fluorinated monomer, fluorinated polymer, resist composition and patterning process | Koji Hasegawa, Katsuhiro Kobayashi, Tsunehiro Nishi, Takeru Watanabe | 2011-07-19 |
| 7928262 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Katsuhiro Kobayashi, Youichi Ohsawa, Takeru Watanabe | 2011-04-19 |
| 7919226 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Youichi Ohsawa, Takeru Watanabe, Katsuhiro Kobayashi | 2011-04-05 |
| 7902385 | Ester compounds and their preparation, polymers, resist compositions and patterning process | Masaki Ohashi, Takeru Watanabe | 2011-03-08 |
| 7879530 | Antireflective coating composition, antireflective coating, and patterning process | Seiichiro Tachibana, Kazumi Noda, Jun Hatakeyama | 2011-02-01 |
| 7871752 | Lactone-containing compound, polymer, resist composition, and patterning process | Koji Hasegawa, Tsunehiro Nishi, Seiichiro Tachibana | 2011-01-18 |
| 7868199 | Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process | Koji Hasegawa, Tsunehiro Nishi, Masaki Ohashi, Takeru Watanabe | 2011-01-11 |