Issued Patents 2011
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8062831 | Carboxyl-containing lactone compound, polymer, resist composition, and patterning process | Satoshi Shinachi, Tsunehiro Nishi, Koji Hasegawa, Takeshi Kinsho, Takeru Watanabe | 2011-11-22 |
| 8062828 | Positive resist composition and patterning process | Youichi Ohsawa, Takeshi Kinsho, Masaki Ohashi, Takeru Watanabe, Jun Hatakeyama | 2011-11-22 |
| 8057985 | Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process | Masaki Ohashi, Takeshi Kinsho, Youichi Ohsawa, Jun Hatakeyama | 2011-11-15 |
| 8048610 | Sulfonium salt-containing polymer, resist composition, and patterning process | Youichi Ohsawa, Jun Hatakeyama, Takeshi Kinsho | 2011-11-01 |
| 8039198 | Sulfonium salt-containing polymer, resist composition, and patterning process | Jun Hatakeyama, Youichi Ohsawa, Masaki Ohashi | 2011-10-18 |
| 7879530 | Antireflective coating composition, antireflective coating, and patterning process | Kazumi Noda, Jun Hatakeyama, Takeshi Kinsho | 2011-02-01 |
| 7871752 | Lactone-containing compound, polymer, resist composition, and patterning process | Koji Hasegawa, Tsunehiro Nishi, Takeshi Kinsho | 2011-01-18 |