Issued Patents 2011
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8062828 | Positive resist composition and patterning process | Takeshi Kinsho, Masaki Ohashi, Seiichiro Tachibana, Takeru Watanabe, Jun Hatakeyama | 2011-11-22 |
| 8057985 | Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process | Masaki Ohashi, Takeshi Kinsho, Jun Hatakeyama, Seiichiro Tachibana | 2011-11-15 |
| 8048610 | Sulfonium salt-containing polymer, resist composition, and patterning process | Jun Hatakeyama, Seiichiro Tachibana, Takeshi Kinsho | 2011-11-01 |
| 8039198 | Sulfonium salt-containing polymer, resist composition, and patterning process | Seiichiro Tachibana, Jun Hatakeyama, Masaki Ohashi | 2011-10-18 |
| 8030515 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Katsuhiro Kobayashi, Takeshi Kinsho, Takeru Watanabe | 2011-10-04 |
| 8021822 | Positive resist compositions and patterning process | Takeshi Kinsho, Takeru Watanabe | 2011-09-20 |
| 8017302 | Positive resist compositions and patterning process | Takeshi Kinsho, Takeru Watanabe | 2011-09-13 |
| 7993811 | Positive resist compositions and patterning process | Takeshi Kinsho, Takeru Watanabe | 2011-08-09 |
| 7977027 | Resist composition and patterning process | Takanobu Takeda, Osamu Watanabe, Satoshi Watanabe, Ryuji Koitabashi, Tamotsu Watanabe | 2011-07-12 |
| 7928262 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Katsuhiro Kobayashi, Takeshi Kinsho, Takeru Watanabe | 2011-04-19 |
| 7919226 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Takeru Watanabe, Takeshi Kinsho, Katsuhiro Kobayashi | 2011-04-05 |
| 7871761 | Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern | Jun Hatakeyama, Toshihiko Fujii | 2011-01-18 |