Issued Patents 2011
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8062828 | Positive resist composition and patterning process | Youichi Ohsawa, Takeshi Kinsho, Seiichiro Tachibana, Takeru Watanabe, Jun Hatakeyama | 2011-11-22 |
| 8057985 | Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process | Takeshi Kinsho, Youichi Ohsawa, Jun Hatakeyama, Seiichiro Tachibana | 2011-11-15 |
| 8057982 | Monomer, resist composition, and patterning process | Jun Hatakeyama, Takeshi Kinsho, Kazuhiro Katayama | 2011-11-15 |
| 8053165 | Hydroxyl-containing monomer, polymer, resist composition, and patterning process | Takeshi Kinsho, Koji Hasegawa, Takeru Watanabe | 2011-11-08 |
| 8039198 | Sulfonium salt-containing polymer, resist composition, and patterning process | Seiichiro Tachibana, Jun Hatakeyama, Youichi Ohsawa | 2011-10-18 |
| 7998657 | Ester compounds and their preparation, polymers, resist compositions and patterning process | Takeshi Kinsho, Takeru Watanabe | 2011-08-16 |
| 7985528 | Positive resist composition and patterning process | Tsunehiro Nishi, Takeshi Kinsho, Koji Hasegawa, Masashi Iio | 2011-07-26 |
| 7902385 | Ester compounds and their preparation, polymers, resist compositions and patterning process | Takeshi Kinsho, Takeru Watanabe | 2011-03-08 |
| 7868199 | Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process | Koji Hasegawa, Takeshi Kinsho, Tsunehiro Nishi, Takeru Watanabe | 2011-01-11 |