Issued Patents 2011
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8062831 | Carboxyl-containing lactone compound, polymer, resist composition, and patterning process | Satoshi Shinachi, Tsunehiro Nishi, Koji Hasegawa, Takeshi Kinsho, Seiichiro Tachibana | 2011-11-22 |
| 8062828 | Positive resist composition and patterning process | Youichi Ohsawa, Takeshi Kinsho, Masaki Ohashi, Seiichiro Tachibana, Jun Hatakeyama | 2011-11-22 |
| 8053165 | Hydroxyl-containing monomer, polymer, resist composition, and patterning process | Takeshi Kinsho, Masaki Ohashi, Koji Hasegawa | 2011-11-08 |
| 8030515 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Katsuhiro Kobayashi, Youichi Ohsawa, Takeshi Kinsho | 2011-10-04 |
| 8021822 | Positive resist compositions and patterning process | Youichi Ohsawa, Takeshi Kinsho | 2011-09-20 |
| 8017302 | Positive resist compositions and patterning process | Youichi Ohsawa, Takeshi Kinsho | 2011-09-13 |
| 7998657 | Ester compounds and their preparation, polymers, resist compositions and patterning process | Masaki Ohashi, Takeshi Kinsho | 2011-08-16 |
| 7993811 | Positive resist compositions and patterning process | Youichi Ohsawa, Takeshi Kinsho | 2011-08-09 |
| 7981589 | Fluorinated monomer, fluorinated polymer, resist composition and patterning process | Koji Hasegawa, Takeshi Kinsho, Katsuhiro Kobayashi, Tsunehiro Nishi | 2011-07-19 |
| 7928262 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Katsuhiro Kobayashi, Youichi Ohsawa, Takeshi Kinsho | 2011-04-19 |
| 7919226 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Youichi Ohsawa, Takeshi Kinsho, Katsuhiro Kobayashi | 2011-04-05 |
| 7902385 | Ester compounds and their preparation, polymers, resist compositions and patterning process | Masaki Ohashi, Takeshi Kinsho | 2011-03-08 |
| 7868199 | Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process | Koji Hasegawa, Takeshi Kinsho, Tsunehiro Nishi, Masaki Ohashi | 2011-01-11 |