Issued Patents 2005
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6905556 | Method and apparatus for using surfactants in supercritical fluid processing of wafers | Raashina Humayun, Patrick Joyce, Krishnan Shrinivasan, Dennis W. Hess, Satyanarayana Myneni +1 more | 2005-06-14 |
| 6867152 | Properties of a silica thin film produced by a rapid vapor deposition (RVD) process | Dennis M. Hausmann, Patrick A. Van Cleemput, Bunsen B. Nie, Francisco Juarez, Teresa Pong | 2005-03-15 |
| 6848455 | Method and apparatus for removing photoresist and post-etch residue from semiconductor substrates by in-situ generation of oxidizing species | Krishnan Shrinivasan | 2005-02-01 |