DH

Dennis M. Hausmann

NS Novellus Systems: 1 patents #27 of 117Top 25%
Harvard University: 1 patents #14 of 85Top 20%
📍 Lake Oswego, OR: #9 of 72 inventorsTop 15%
🗺 Oregon: #330 of 2,197 inventorsTop 20%
Overall (2005): #58,444 of 245,428Top 25%
2
Patents 2005

Issued Patents 2005

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
6969539 Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide Roy G. Gordon, Jill S. Becker, Seigi Suh 2005-11-29
6867152 Properties of a silica thin film produced by a rapid vapor deposition (RVD) process Adrianne K. Tipton, Patrick A. Van Cleemput, Bunsen B. Nie, Francisco Juarez, Teresa Pong 2005-03-15