Issued Patents 2005
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6951624 | Method and apparatus of arrayed sensors for metrological control | Yehiel Gotkis, Aleksander Owczarz, David Hemker, Nicolas Bright | 2005-10-04 |
| 6937915 | Apparatus and methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control | David Hemker, Yehiel Gotkis, Aleksander Owczarz, Bruno Morel, Damon Vincent Williams | 2005-08-30 |
| 6929531 | System and method for metal residue detection and mapping within a multi-step sequence | Yehiel Gotkis, Aleksander Owczarz, David Hemker, Nicolas Bright | 2005-08-16 |
| 6925348 | Methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control | David Hemker, Yehiel Gotkis, Aleksander Owczarz, Bruno Morel, Damon Vincent Williams | 2005-08-02 |
| 6922053 | Complementary sensors metrological process and method and apparatus for implementing the same | Yehiel Gotkis, Aleksander Owczarz, David Hemker, Nicolas Bright | 2005-07-26 |
| 6896596 | Polishing pad ironing system | Yehiel Gotkis, Aleksander Owczarz | 2005-05-24 |
| 6894491 | Method and apparatus for metrological process control implementing complementary sensors | Yehiel Gotkis, Aleksander Owczarz, David Hemker, Nicolas Bright | 2005-05-17 |
| 6890245 | Byproduct control in linear chemical mechanical planarization system | — | 2005-05-10 |
| 6875322 | Electrochemical assisted CMP | — | 2005-04-05 |
| 6859765 | Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detection | Yehiel Gotkis, Vladimir Katz, David Hemker, Nicolas Bright | 2005-02-22 |