Issued Patents 2005
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6962879 | Method of plasma etching silicon nitride | David R. Pirkle, S. M. Reza Sadjadi, Andrew S. Li | 2005-11-08 |
| 6949460 | Line edge roughness reduction for trench etch | Eric Wagganer, Daniel Le, Peter Loewenhardt | 2005-09-27 |
| 6949469 | Methods and apparatus for the optimization of photo resist etching in a plasma processing system | Yu-Huei Cheng, Vinay V. Phoray, Hanzhong Xiao, Peter Loewenhardt | 2005-09-27 |
| 6916697 | Etch back process using nitrous oxide | Rao Annapragada | 2005-07-12 |
| 6841483 | Unique process chemistry for etching organic low-k materials | James R. Bowers, Ian J. Morey, Wayne Babie, Michael Goss | 2005-01-11 |