Issued Patents 2005
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6935932 | Polishing apparatus and method | Norio Kimura, Mitsuhiko Shirakashi, Katsuya Okumura, You Ishii, Junji Kunisawa | 2005-08-30 |
| 6935928 | Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method | Kazuhito Uchikura, Kazuo Nishimoto, Masayuki Hattori, Nobuo Kawahashi, Yukiteru Matsui +3 more | 2005-08-30 |
| 6924227 | Slurry for chemical mechanical polishing and method of manufacturing semiconductor device | Gaku Minamihaba, Nobuyuki Kurashima, Nobuo Kawahashi, Masayuki Hattori, Kazuo Nishimoto | 2005-08-02 |
| 6924236 | Manufacturing method of semiconductor device | Katsuya Okumura | 2005-08-02 |
| 6913513 | Polishing apparatus | Norio Kimura, Katsuya Okumura | 2005-07-05 |
| 6897143 | Method of manufacturing semiconductor device including two-step polishing operation for cap metal | Hiroshi Toyoda, Gaku Minamihaba, Dai Fukushima, Tetsuo Matsuda, Hisashi Kaneko | 2005-05-24 |
| 6896590 | CMP slurry and method for manufacturing a semiconductor device | Gaku Minamihaba | 2005-05-24 |
| 6875088 | Polishing member and method of manufacturing semiconductor device | Yukiteru Matsui | 2005-04-05 |
| 6858539 | Post-CMP treating liquid and method for manufacturing semiconductor device | Gaku Minamihaba, Yukiteru Matsui, Nobuyuki Kurashima | 2005-02-22 |
| 6858936 | Semiconductor device having an improved construction in the interlayer insulating film | Gaku Minamihaba, Dai Fukushima, Yoshikuni Tateyama | 2005-02-22 |