Issued Patents 2003
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6667415 | Tertiary butyl 4,4-bis(4′-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same | Fujio Yagihashi, Minoru Takamizawa, Akinobu Tanaka, Yoshio Kawai, Tadahito Matsuda | 2003-12-23 |
| 6660447 | Polymers, resist compositions and patterning process | Jun Hatakeyama, Yuji Harada, Masaru Sasago, Masayuki Endo, Shinji Kishimura | 2003-12-09 |
| 6653044 | Chemical amplification type resist composition | Takanobu Takeda, Osamu Watanabe, Jun Hatakeyama, Tsunehiro Nishi, Takeshi Kinsho | 2003-11-25 |
| 6623909 | Polymers, resist compositions and patterning process | Jun Hatakeyama, Toshiaki Takahashi, Toshinobu Ishihara, Tohru Kubota, Yoshio Kawai | 2003-09-23 |
| 6605361 | Coating composition for lenses and method for producing the same | Takanobu Itoh | 2003-08-12 |
| 6593434 | Preparing polyester block copolymer with excess unreacted lactones to be removed | — | 2003-07-15 |
| 6593056 | Chemically amplified positive resist composition and patterning method | Takanobu Takeda, Katsuya Takemura, Kenji Koizumi | 2003-07-15 |
| 6594324 | Correlation operation method and matched filter | Tetsuhiko Miyatani | 2003-07-15 |
| 6582880 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +5 more | 2003-06-24 |
| 6579658 | Polymers, resist compositions and patterning process | Jun Hatakeyama, Yuji Harada | 2003-06-17 |
| 6559915 | Optical films having matt property, films having a high transmittance, polarizing plates and liquid crystal display devices | Ichiro Amimori, Hidetoshi Watanabe, Hiroshi Inoue | 2003-05-06 |
| 6551758 | Onium salts, photoacid generators, resist compositions, and patterning process | Youichi Ohsawa, Kazunori Maeda | 2003-04-22 |
| 6541179 | Resist compositions and patterning process | Jun Hatakeyama, Youichi Ohsawa, Tsunehiro Nishi | 2003-04-01 |
| 6511787 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo +5 more | 2003-01-28 |