Issued Patents 2003
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6656024 | Method and apparatus for reducing compressed dry air usage during chemical mechanical planarization | David Wei, Yehiel Gotkis | 2003-12-02 |
| 6626743 | Method and apparatus for conditioning a polishing pad | — | 2003-09-30 |
| 6616801 | Method and apparatus for fixed-abrasive substrate manufacturing and wafer polishing in a single process path | — | 2003-09-09 |
| 6612902 | Method and apparatus for end point triggering with integrated steering | Herbert E. Litvak | 2003-09-02 |
| 6612904 | Field controlled polishing apparatus | Robert G. Boehm, Jr. | 2003-09-02 |
| 6609961 | Chemical mechanical planarization belt assembly and method of assembly | Michael S. Lacy | 2003-08-26 |
| 6607425 | Pressurized membrane platen design for improving performance in CMP applications | Rod Kistler, Alek Owczarz | 2003-08-19 |
| 6599765 | Apparatus and method for providing a signal port in a polishing pad for optical endpoint detection | Michael S. Lacy | 2003-07-29 |
| 6592437 | Active gimbal ring with internal gel and methods for making same | Allan Paterson | 2003-07-15 |
| 6585572 | Subaperture chemical mechanical polishing system | Miguel Saldana, Yehiel Gotkis, Aleksander Owczarz | 2003-07-01 |
| 6579407 | Method and apparatus for aligning and setting the axis of rotation of spindles of a multi-body system | Aleksander Owczarz, Miguel Saldana | 2003-06-17 |
| 6547651 | Subaperture chemical mechanical planarization with polishing pad conditioning | Michael S. Lacy, David G. Halley | 2003-04-15 |