Issued Patents 2003
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6625191 | Very narrow band, two chamber, high rep rate gas discharge laser system | David S. Knowles, Daniel J. W. Brown, Herve A. Besaucele, David W. Myers, Alexander I. Ershov +10 more | 2003-09-23 |
| 6590922 | Injection seeded F2 laser with line selection and discrimination | Eckehard D. Onkels, Richard L. Sandstrom, William N. Partlo, Alexander I. Ershov, Choonghoon Oh | 2003-07-08 |
| 6586757 | Plasma focus light source with active and buffer gas control | Stephan T. Melnychuk, William N. Partlo, Igor V. Fomenkov, Daniel L. Birx late of, Richard L. Sandstrom +1 more | 2003-07-01 |
| 6566668 | Plasma focus light source with tandem ellipsoidal mirror units | John Rauch, William N. Partlo, Igor V. Fomenkov, Daniel L. Birx, Richard L. Sandstrom +1 more | 2003-05-20 |
| 6566667 | Plasma focus light source with improved pulse power system | William N. Partlo, Igor V. Fomenkov, I. Roger Oliver, Daniel L. Birx | 2003-05-20 |
| 6567450 | Very narrow band, two chamber, high rep rate gas discharge laser system | David W. Myers, Herve A. Besaucele, Alexander I. Ershov, William N. Partlo, Richard L. Sandstrom +7 more | 2003-05-20 |
| 6556600 | Injection seeded F2 laser with centerline wavelength control | Richard L. Sandstrom, William N. Partlo, Alexander I. Ershov, Eckehard D. Onkels, Choonghoon Oh | 2003-04-29 |
| 6549551 | Injection seeded laser with precise timing control | Richard L. Sandstrom, William N. Partlo, Alexander I. Ershov | 2003-04-15 |
| RE38054 | Reliable, modular, production quality narrow-band high rep rate F2 laser | Thomas Hofmann, Jean-Marc Hueber, Palash P. Das, Toshihiko Ishihara, Thomas Patrick Duffey +7 more | 2003-04-01 |