Issued Patents 2002
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6475069 | Control of removal rates in CMP | Terence M. Thomas, Qianqiu (Christine) Ye, Joseph So | 2002-11-05 |
| 6454634 | Polishing pads for chemical mechanical planarization | David B. James, Arun Vishwanathan, Lee Melbourne Cook, David Shidner | 2002-09-24 |
| 6447373 | Chemical mechanical polishing slurries for metal | Craig Lack, Qiuliang Luo, Qianqiu (Christine) Ye, Vikas Sachan, Terence M. Thomas | 2002-09-10 |
| 6419553 | Methods for break-in and conditioning a fixed abrasive polishing pad | Vilas Koinkar, Reza Golzarian, Matthew VanHanehem, Qiuliang Luo, James Shen | 2002-07-16 |