Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6475069 | Control of removal rates in CMP | Qianqiu (Christine) Ye, Joseph So, Peter A. Burke | 2002-11-05 |
| 6447373 | Chemical mechanical polishing slurries for metal | Craig Lack, Qiuliang Luo, Qianqiu (Christine) Ye, Vikas Sachan, Peter A. Burke | 2002-09-10 |
| 6379406 | Polishing compositions for semiconductor substrates | Craig Lack, Steven P. Goehringer | 2002-04-30 |