Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6458020 | Slurry recirculation in chemical mechanical polishing | Jeffrey A. Brigante, Thomas L. Conrad, David J. Fontaine, Rock Nadeau, Paul Smith | 2002-10-01 |
| 6352596 | Post CMP cleaning method using a brush cleaner with torque monitor | Gary J. Beardsley, Timothy Scott Bullard, Cuc K. Huynh, David Walker | 2002-03-05 |
| 6334807 | Chemical mechanical polishing in-situ end point system | Richard J. Lebel, Rock Nadeau, Martin P. O'Boyle, Paul Smith, Hemantha K. Wickramasinghe | 2002-01-01 |