Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6458020 | Slurry recirculation in chemical mechanical polishing | Jeffrey A. Brigante, Thomas L. Conrad, David J. Fontaine, Rock Nadeau, Theodore G. van Kessel | 2002-10-01 |
| 6340601 | Method for reworking copper metallurgy in semiconductor devices | Thomas F. Curran, Timothy C. Krywanczyk, Michael S. Lube, Matthew D. Moon, Rock Nadeau +6 more | 2002-01-22 |
| 6334807 | Chemical mechanical polishing in-situ end point system | Richard J. Lebel, Rock Nadeau, Martin P. O'Boyle, Theodore G. van Kessel, Hemantha K. Wickramasinghe | 2002-01-01 |