MO

Martin P. O'Boyle

IBM: 1 patents #1,916 of 5,400Top 40%
📍 Peekskill, NY: #20 of 44 inventorsTop 50%
🗺 New York: #3,002 of 9,277 inventorsTop 35%
Overall (2002): #159,402 of 266,432Top 60%
1
Patents 2002

Issued Patents 2002

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
6334807 Chemical mechanical polishing in-situ end point system Richard J. Lebel, Rock Nadeau, Paul Smith, Theodore G. van Kessel, Hemantha K. Wickramasinghe 2002-01-01