Issued Patents 2002
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6500356 | Selectively etching silicon using fluorine without plasma | Haruhiro Harry Goto, William Harshbarger | 2002-12-31 |
| 6500265 | Apparatus for electrostatically maintaining subtrate flatness | Quanyuan Shang, Robert Robertson, James T. Gardner | 2002-12-31 |
| 6468601 | Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology | Quanyuan Shang, Robert Robertson, Dan Maydan | 2002-10-22 |
| 6451390 | Deposition of TEOS oxide using pulsed RF plasma | Haruhiro Harry Goto, Takako Takehara, Carl A. Sorensen, William Harshbarger | 2002-09-17 |
| 6444277 | Method for depositing amorphous silicon thin films onto large area glass substrates by chemical vapor deposition at high deposition rates | Robert Robertson, Pamela Lou, Marc M. Kollrack, Angela Lee, Dan Maydan | 2002-09-03 |
| 6355108 | Film deposition using a finger type shadow frame | Tae Kyung Won, Quanyuan Shang, Robert Robertson, Soo Young Choi, Robert I. Greene +1 more | 2002-03-12 |
| 6352910 | Method of depositing amorphous silicon based films having controlled conductivity | William Harshbarger, Takako Takehara, Jeff Olsen, Regina Qiu, Yvonne LeGrice +2 more | 2002-03-05 |
| 6338874 | Method for multilayer CVD processing in a single chamber | Robert Robertson, Pamela Lou, Marc M. Kollrack, Angela Lee, Dan Maydan | 2002-01-15 |