Issued Patents 2002
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6471833 | High etch rate method for plasma etching silicon nitride | Ajay Kumar, Anisul Khan, Jeffrey D. Chin | 2002-10-29 |
| 6391788 | Two etchant etch method | Anisul Khan, Ajay Kumar, Jeffrey D. Chinn | 2002-05-21 |
| 6383941 | Method of etching organic ARCs in patterns having variable spacings | Meihua Shen, Kenju Nishikido, Jeffrey D. Chinn | 2002-05-07 |
| 6380095 | Silicon trench etch using silicon-containing precursors to reduce or avoid mask erosion | Wei Liu, Yiqiong Wang, Maocheng Li, Anisul Khan, Shaoher X. Pan | 2002-04-30 |
| 6372655 | Two etchant etch method | Anisul Khan, Ajay Kumar, Jeffrey D. Chinn | 2002-04-16 |