Issued Patents 2002
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6415198 | Plasma etching of silicon using a chlorine chemistry augmented with sulfur dioxide | Padmapani Nallan, Ajay Kumar | 2002-07-02 |
| 6391788 | Two etchant etch method | Anisul Khan, Ajay Kumar, Dragan Podlesnik | 2002-05-21 |
| 6383941 | Method of etching organic ARCs in patterns having variable spacings | Meihua Shen, Kenju Nishikido, Dragan Podlesnik | 2002-05-07 |
| 6372151 | Storage poly process without carbon contamination | Taeho Shin, Nam Hun Kim | 2002-04-16 |
| 6372655 | Two etchant etch method | Anisul Khan, Ajay Kumar, Dragan Podlesnik | 2002-04-16 |
| 6368978 | Hydrogen-free method of plasma etching indium tin oxide | Ajay Kumar, Padmapani Nallan | 2002-04-09 |