Issued Patents 2002
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6482573 | Exposure correction based on reflective index for photolithographic process control | Jayendra D. Bhakta, Zicheng Gary Ling, Weizhong Wang, Warren T. Yu | 2002-11-19 |
| 6418946 | Apparatus for automatically cleaning resist nozzle | Vincent L. Marinaro, Ted Wakamiya | 2002-07-16 |
| 6368985 | Dual track/stepper interface configuration for wafer processing | Ted Wakamiya, Vince L. Marinaro | 2002-04-09 |
| 6360959 | Dual resist dispense nozzle for wafer tracks | Vince L. Marinaro, Ted Wakamiya | 2002-03-26 |
| 6361599 | Mechanism for dispensing liquid onto an integrated circuit wafer with minimized back-splash | Vincent L. Marinaro | 2002-03-26 |
| 6336960 | System and method for purging air bubbles from filters | Vince L. Marinaro, Ted Wakamiya | 2002-01-08 |