Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6482573 | Exposure correction based on reflective index for photolithographic process control | Jayendra D. Bhakta, Weizhong Wang, Warren T. Yu, Eric Kent | 2002-11-19 |
| 6479350 | Reduced masking step CMOS transistor formation using removable amorphous silicon sidewall spacers | Todd P. Lukanc, Raymond T. Lee | 2002-11-12 |
| 6368762 | Active mask exposure compensation of underlying nitride thickness variation to reduce critical dimension (CD) variation | — | 2002-04-09 |