Issued Patents 1994
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5334282 | Electron beam lithography system and method | Yoshinori Nakayama | 1994-08-02 |
| 5334845 | Charged beam exposure method and apparatus as well as aperture stop and production method thereof | Hiroaki Wakabayashi, Yoshinori Nakayama, Fumio Murai | 1994-08-02 |
| 5305364 | Projection type X-ray lithography apparatus | Kozo Mochiji, Hiroaki Oizumi, Shigeo Moriyama, Tsuneo Terasawa, Masaaki Itou | 1994-04-19 |
| 5283440 | Electron beam writing system used in a cell projection method | Yasunari Sohda, Hideo Todokoro, Norio Saitou, Haruo Yoda, Hiroyuki Itoh +2 more | 1994-02-01 |