| 6818064 |
Photoresist dispense arrangement by compensation for substrate reflectivity |
— |
2004-11-16 |
| 6433854 |
Method of illumination uniformity in photolithographic systems |
Kouros Ghandehari, Satyendra Sethi |
2002-08-13 |
| 6411367 |
Modified optics for imaging of lens limited subresolution features |
Subhas Bothra, Satyendra Sethi |
2002-06-25 |
| 6319735 |
Photoresist dispense method by compensation for substrate reflectivity |
— |
2001-11-20 |
| 6313542 |
Method and apparatus for detecting edges under an opaque layer |
Dipankar Pramanik, Kouros Ghandehari, Satyendra Sethi |
2001-11-06 |
| 6274940 |
Semiconductor wafer, a chemical-mechanical alignment mark, and an apparatus for improving alignment for metal masking in conjunction with oxide and tungsten CMP |
Charles Franklin Drill, Milind Weling |
2001-08-14 |
| 6262795 |
Apparatus and method for the improvement of illumination uniformity in photolithographic systems |
Kouros Ghandehari, Satyendra Sethi |
2001-07-17 |
| 6162586 |
Method for substantially preventing footings in chemically amplified deep ultra violet photoresist layers |
Samit Sengupta, Subhas Bothra |
2000-12-19 |
| 5952135 |
Method for alignment using multiple wavelengths of light |
Kouros Ghandehari, Satyendra Sethi |
1999-09-14 |
| 5952241 |
Method and apparatus for improving alignment for metal masking in conjuction with oxide and tungsten CMP |
Charles Franklin Drill, Milind Weling |
1999-09-14 |
| 5852497 |
Method and apparatus for detecting edges under an opaque layer |
Dipankar Pramanik, Kouros Ghandehari, Satyendra Sethi |
1998-12-22 |
