| 7018282 |
Customized polishing pad for selective process performance during chemical mechanical polishing |
Milind Weling |
2006-03-28 |
| 6572439 |
Customized polishing pad for selective process performance during chemical mechanical polishing |
Milind Weling |
2003-06-03 |
| 6413152 |
Apparatus for performing chemical-mechanical planarization with improved process window, process flexibility and cost |
Samit Sengupta |
2002-07-02 |
| 6410440 |
Method and apparatus for a gaseous environment providing improved control of CMP process |
Milind Weling |
2002-06-25 |
| 6347979 |
Slurry dispensing carrier ring |
— |
2002-02-19 |
| 6274940 |
Semiconductor wafer, a chemical-mechanical alignment mark, and an apparatus for improving alignment for metal masking in conjunction with oxide and tungsten CMP |
Daniel C. Baker, Milind Weling |
2001-08-14 |
| 6241587 |
System for dislodging by-product agglomerations from a polishing pad of a chemical mechanical polishing machine |
Ian Robert Harvey |
2001-06-05 |
| 6190236 |
Method and system for vacuum removal of chemical mechanical polishing by-products |
— |
2001-02-20 |
| 6139428 |
Conditioning ring for use in a chemical mechanical polishing machine |
Milind Weling |
2000-10-31 |
| 6022265 |
Complementary material conditioning system for a chemical mechanical polishing machine |
Calvin T. Gabriel, Milind Weling, Richard Russ, David E. Henderson |
2000-02-08 |
| 5952241 |
Method and apparatus for improving alignment for metal masking in conjuction with oxide and tungsten CMP |
Daniel C. Baker, Milind Weling |
1999-09-14 |
| 5653622 |
Chemical mechanical polishing system and method for optimization and control of film removal uniformity |
Milind Weling |
1997-08-05 |
