Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12394673 | Semiconductor manufacturing process | Dian Han Liu, Wen Yi Tan | 2025-08-19 |
| 12216072 | Reticle thermal expansion calibration method capable of improving sub-recipe | Maohua Ren, Wen Yi Tan | 2025-02-04 |
| 12204247 | Lithography film stack and lithography method | Ching-Shu Lo, Maohua Ren, Wen Yi Tan | 2025-01-21 |
| 12020932 | Photoresist coating method | Shi Teng Zhong, Ching-Shu Lo, Wen Yi Tan | 2024-06-25 |
| 11692946 | Method for aligning to a pattern on a wafer | Dian Han Liu, Maohua Ren, Wen Yi Tan | 2023-07-04 |
| 11527438 | Manufacturing method of contact structure | Xiongwu He, Weiguo Xu, Wen Yi Tan | 2022-12-13 |
| 9494873 | Asymmetry compensation method used in lithography overlay process | En-Chiuan Liou, Teng-Chin Kuo, Chun-Chi Yu | 2016-11-15 |
| 9448471 | Photo-mask and method of manufacturing semiconductor structures by using the same | En-Chiuan Liou, Yu-Cheng Tung, Teng-Chin Kuo, Chun-Chi Yu | 2016-09-20 |
| 9400435 | Method of correcting overlay error | En-Chiuan Liou, Chia-Chang Hsu, Teng-Chin Kuo, Chia-Hung Wang, Tuan-Yen Yu +1 more | 2016-07-26 |
| 9305847 | Method of manufacturing semiconductor device having gate metal | Shin-Chi Chen, Chih-Yueh Li, Shui-Yen Lu, Chi-Mao Hsu, Yu-Hong Kuo +1 more | 2016-04-05 |
| 9245972 | Method for manufacturing semiconductor device | Shin-Chi Chen, Chih-Yueh Li, Shui-Yen Lu, Fong-Lung Chuang | 2016-01-26 |
| 8785115 | Photoresist removal method and patterning process utilizing the same | Hung-Yi Wu, Yu-Wei Cheng, Chang-Mao Wang | 2014-07-22 |
| 8564143 | Overlay mark for multiple pre-layers and currently layer | Yi-Ting Chen, Chien-Hao Chen, Chun-Chi Yu | 2013-10-22 |
| 8524423 | Method of forming assist feature patterns | Yi-Chih Chiang, Sho-Shen Lee, Yi-Ting Chen, Tuan-Yen Yu | 2013-09-03 |
| 8476004 | Method for forming photoresist patterns | Yong Huang, Cheng-Han Wu, Chun-Chi Yu, Hung-Yi Wu | 2013-07-02 |
| 6410447 | Process for removing photoresist material | Lung-Yi Cheng, Cheng-Che Li, Wei-Chiang Lin | 2002-06-25 |
| 6376872 | Focusing and color-filtering structure for semiconductor light-sensitive device | Wei-Chiang Lin | 2002-04-23 |
| 6261861 | Processing flow of a complementary metal-oxide semiconductor color filter | Hua Cheng, Wei-Chiang Lin | 2001-07-17 |
| 6251700 | Method of manufacturing complementary metal-oxide-semiconductor photosensitive device | Wei-Chiang Lin | 2001-06-26 |
| 6242277 | Method of fabricating a complementary metal-oxide semiconductor sensor device | Wei-Chang Lin | 2001-06-05 |
| 6194324 | Method for in-situ removing photoresist material | Lung-Yi Cheng, Cheng-Che Li, Wei-Chiang Lin | 2001-02-27 |
| 6133062 | Method of fabricating focusing and color-filtering structure for semiconductor light-sensitive device | Wei-Chiang Lin | 2000-10-17 |