Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date | Approx Value ⓘ |
|---|---|---|---|---|
| 6410447 | Process for removing photoresist material | Yuan-Chi Pai, Lung-Yi Cheng, Wei-Chiang Lin | 2002-06-25 | $1,858,000 |
| 6194324 | Method for in-situ removing photoresist material | Lung-Yi Cheng, Yuan-Chi Pai, Wei-Chiang Lin | 2001-02-27 | $2,829,000 |