TM

Tasuku Matsumiya

TC Tokyo Ohka Kogyo Co.: 33 patents #25 of 684Top 4%
TC The University Of Chicago: 3 patents #172 of 1,377Top 15%
TT Tokyo Institute Of Technology: 1 patents #411 of 1,159Top 40%
Samsung: 1 patents #49,284 of 75,807Top 70%
Overall (All Time): #106,085 of 4,157,543Top 3%
33
Patents All Time

Issued Patents All Time

Showing 26–33 of 33 patents

Patent #TitleCo-InventorsDate
8232041 Positive resist composition, method of forming resist pattern, and polymeric compound Takahiro Dazai, Tomoyuki Hirano, Daiju Shiono 2012-07-31
8227170 Resist composition, method of forming resist pattern, polymeric compound, and compound Takahiro Dazai, Daiju Shiono, Tomoyuki Hirano, Daichi Takaki, Takayoshi Mori +1 more 2012-07-24
8192915 Positive resist composition, method of forming resist pattern, and polymeric compound Takahiro Dazai, Tomoyuki Hirano, Daiju Shiono 2012-06-05
8182976 Positive resist composition, method of forming resist pattern, and polymeric compound Takahiro Dazai, Tomoyuki Hirano, Daiju Shiono 2012-05-22
8043798 Method of forming fine patterns Tsuyoshi Nakamura, Kiyoshi Ishikawa, Yoshiki Sugeta, Toshikazu Tachikawa 2011-10-25
7923192 Base material for pattern-forming material, positive resist composition and method of resist pattern formation Taku Hirayama, Daiju Shiono, Yohei Kinoshita 2011-04-12
7871753 Positive resist composition and method of forming resist pattern Takako Hirosaki 2011-01-18
7449276 Positive photoresist composition and method for forming resist pattern Takuma Hojo, Kiyoshi Ishikawa, Tsuyoshi Nakamura 2008-11-11