Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
KO

Kosuke Ogasawara — 12 Patents

TLTokyo Electron Limited: 11 patents #663 of 5,567Top 15%
Hitachi: 1 patents #17,777 of 28,497Top 65%
Overall (All Time): #396,045 of 4,157,543Top 10%
12 Patents All Time
Kosuke Ogasawara has been granted 12 US patents while listed as an inventor at Tokyo Electron Limited. The first was granted in 2010 and the most recent in February 2025. Kosuke Ogasawara ranks #396,045 of 4,157,543 US inventors in our database (top 9.5%). Patent records list Kosuke Ogasawara in Rifu, OR, JP.

Patents per Year

Patents granted per year, 2010 to 2025Bar chart with a peak of 2 patents in 2012.peak 22010: 1 patents20102011: 1 patents20112012: 2 patents20122013: 1 patents20132015: 2 patents20152017: 1 patents20172022: 2 patents20222023: 1 patents20232025: 1 patents2025

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
12217973 Method of etching film and plasma processing apparatus Takahisa Iwasaki, Kentaro Ishii, Seiji Ide, Chiju Hsieh 2025-02-04
11721522 Plasma processing method and plasma processing apparatus Kentaro Yamaguchi, Takanori BANSE 2023-08-08
11404282 Method of etching film and plasma processing apparatus Takahisa Iwasaki, Kentaro Ishii, Seiji Ide, Chiju Hsieh 2022-08-02
11367590 Plasma processing method and plasma processing apparatus Kentaro Yamaguchi, Takanori BANSE 2022-06-21
9564342 Method for controlling etching in pitch doubling 2017-02-07
9199095 Particle beam irradiation system and operating method Takuya Nomura, Hideaki Nishiuchi 2015-12-01
8980111 Sidewall image transfer method for low aspect ratio patterns Akiteru Ko 2015-03-17
8580077 Plasma processing apparatus for performing accurate end point detection Susumu Saito, Syuji NOZAWA 2013-11-12
8232207 Substrate processing method Kiyohito Ito 2012-07-31
8187980 Etching method, etching apparatus and storage medium 2012-05-29
7871532 Plasma processing method and post-processing method Akitaka Shimizu, Susumu Saito 2011-01-18
7662646 Plasma processing method and plasma processing apparatus for performing accurate end point detection Susumu Saito, Syuji NOZAWA 2010-02-16