Issued Patents All Time
Showing 51–57 of 57 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8268184 | Etch process for reducing silicon recess | Christopher Cole | 2012-09-18 |
| 8236700 | Method for patterning an ARC layer using SF6 and a hydrocarbon gas | Christopher Cole | 2012-08-07 |
| 7888267 | Method for etching silicon-containing ARC layer with reduced CD bias | Christopher Cole | 2011-02-15 |
| 7743731 | Reduced contaminant gas injection system and method of using | Takashi Enomoto, Masaaki Hagihara, Shinji Hamamoto, Masafumi Urakawa, Arthur Laflamme +1 more | 2010-06-29 |
| 7709397 | Method and system for etching a high-k dielectric material | Lee Chen, Hiromitsu Kambara, Nobuhiro Iwama, Hiromasa Mochiki, Masaaki Hagihara | 2010-05-04 |
| 7531461 | Process and system for etching doped silicon using SF6-based chemistry | — | 2009-05-12 |
| 7361608 | Method and system for forming a feature in a high-k layer | Annie Xia, Lee Chen | 2008-04-22 |