| 5198387 |
Method and apparatus for in-situ doping of deposited silicon |
— |
1993-03-30 |
| 5166770 |
Silicided structures having openings therein |
Che-Chia Wei, Cheng-Eng D. Chen |
1992-11-24 |
| 5101764 |
Method and apparatus for integrating optical sensor into processor |
Lee M. Loewenstein, Ming-Jang Hwang, Steve S. Huang, Rachelle J. Bienstock |
1992-04-07 |
| 5076206 |
Vertical LPCVD reactor |
Dane E. Bailey |
1991-12-31 |
| 5043778 |
Oxide-isolated source/drain transistor |
Clarence W. Teng, Che-Chia Wei |
1991-08-27 |
| 5010032 |
Process for making CMOS device with both P+ and N+ gates including refractory metal silicide and nitride interconnects |
Che-Chia Wei, Roger A. Haken, Richard A. Chapman |
1991-04-23 |
| 4975756 |
SRAM with local interconnect |
Roger A. Haken, Che-Chia Wei, Larry R. Hite |
1990-12-04 |
| 4963502 |
Method of making oxide-isolated source/drain transistor |
Clarence W. Teng, Che-Chia Wei |
1990-10-16 |
| 4920073 |
Selective silicidation process using a titanium nitride protective layer |
Che-Chia Wei, James G. Bohlman, Monte A. Douglas |
1990-04-24 |
| 4890141 |
CMOS device with both p+ and n+ gates |
Che-Chia Wei, Roger A. Haken, Richard A. Chapman |
1989-12-26 |
| 4788160 |
Process for formation of shallow silicided junctions |
Robert H. Havemann, Roger A. Haken, Che-Chia Wei |
1988-11-29 |
| 4746219 |
Local interconnect |
Thomas C. Holloway, Che-Chia Wei, Roger A. Haken, David A. Bell |
1988-05-24 |
| 4690730 |
Oxide-capped titanium silicide formation |
Che-Chia Wei, Roger A. Haken, Thomas C. Holloway, David A. Bell |
1987-09-01 |
| 4676866 |
Process to increase tin thickness |
Che-Chia Wei, Roger A. Haken, Thomas C. Holloway |
1987-06-30 |
| 4657628 |
Process for patterning local interconnects |
Thomas C. Holloway, Che-Chia Wei, Roger A. Haken, David A. Bell |
1987-04-14 |