Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date | Approx Value ⓘ |
|---|---|---|---|---|
| 5256566 | Method for in-situ doping of deposited silicon | — | 1993-10-26 | $5,113,000 |
| 5076206 | Vertical LPCVD reactor | Thomas E. Tang | 1991-12-31 | $3,079,000 |
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date | Approx Value ⓘ |
|---|---|---|---|---|
| 5256566 | Method for in-situ doping of deposited silicon | — | 1993-10-26 | $5,113,000 |
| 5076206 | Vertical LPCVD reactor | Thomas E. Tang | 1991-12-31 | $3,079,000 |