Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for in-situ doping of deposited silicon

Method for in-situ doping of deposited silicon

US Patent 5256566 · Granted Oct 26, 1993

Estimated economic value: $5,113,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Vertical LPCVD reactor1991