| 7479668 |
Source/drain extension implant process for use with short time anneals |
Amitabh Jain |
2009-01-20 |
| 7297605 |
Source/drain extension implant process for use with short time anneals |
Amitabh Jain |
2007-11-20 |
| 6847089 |
Gate edge diode leakage reduction |
Srinivasan Chakravarthi, Suresh Potla, Amitabh Jain |
2005-01-25 |
| 5482871 |
Method for forming a mesa-isolated SOI transistor having a split-process polysilicon gate |
— |
1996-01-09 |
| 5240512 |
Method and structure for forming a trench within a semiconductor layer of material |
— |
1993-08-31 |
| 5225697 |
dRAM cell and method |
Satwinder S. Malhi, William F. Richardson |
1993-07-06 |
| 5185280 |
Method of fabricating a SOI transistor with pocket implant and body-to-source (BTS) contact |
Theodore W. Houston |
1993-02-09 |
| 5162882 |
Semiconductor over insulator mesa |
— |
1992-11-10 |
| 5120675 |
Method for forming a trench within a semiconductor layer of material |
— |
1992-06-09 |
| 5039621 |
Semiconductor over insulator mesa and method of forming the same |
— |
1991-08-13 |
| 4956307 |
Thin oxide sidewall insulators for silicon-over-insulator transistors |
Mishel Matloubian, Ravishankar Sundaresan |
1990-09-11 |
| 4939104 |
Method for forming a buried lateral contact |
Donald M. Bordelon, William F. Richardson, Satwinder S. Malhi |
1990-07-03 |
| 4797373 |
Method of making dRAM cell with trench capacitor |
Satwinder S. Malhi |
1989-01-10 |
| 4659426 |
Plasma etching of refractory metals and their silicides |
Clyde R. Fuller, Robert H. Eklund, Dave Monahan |
1987-04-21 |
| 4580330 |
Integrated circuit isolation |
Clarence W. Teng, William R. Hunter, Christopher Slawinski, Robert Reid Doering |
1986-04-08 |
| 4541167 |
Method for integrated circuit device isolation |
Robert H. Havemann |
1985-09-17 |
| 4538343 |
Channel stop isolation technology utilizing two-step etching and selective oxidation with sidewall masking |
Clarence W. Teng, William R. Hunter |
1985-09-03 |