Issued Patents All Time
Showing 101–125 of 136 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8846466 | Forming inter-device STI regions and intra-device STI regions using different dielectric materials | Feng Yuan, Hung-Ming Chen, Chang-Yun Chang | 2014-09-30 |
| 8847293 | Gate structure for semiconductor device | Feng Yuan, Chih Chieh Yeh, Wei-Jen Lai | 2014-09-30 |
| 8846465 | Integrated circuit with multi recessed shallow trench isolation | Chang-Yun Chang | 2014-09-30 |
| 8796156 | Cross OD FinFET patterning | Ming-Feng Shieh, Chang-Yun Chang | 2014-08-05 |
| 8748993 | FinFETs with multiple fin heights | Chih Chieh Yeh, Chang-Yun Chang, Feng Yuan | 2014-06-10 |
| 8747992 | Non-uniform semiconductor device active area pattern formation | Shao-Ming Yu | 2014-06-10 |
| 8723271 | Voids in STI regions for forming bulk FinFETs | Feng Yuan, Hung-Ming Chen, Chang-Yun Chang | 2014-05-13 |
| 8673709 | FinFETs with multiple fin heights | Chih Chieh Yeh, Chang-Yun Chang, Feng Yuan | 2014-03-18 |
| 8653576 | Method of fabricating a SONOS gate structure with dual-thickness oxide | Tzyh-Cheang Lee, Jiunn-Ren Hwang | 2014-02-18 |
| 8653609 | FinFET design with reduced current crowding | Chih Chieh Yeh | 2014-02-18 |
| 8653608 | FinFET design with reduced current crowding | Chih Chieh Yeh | 2014-02-18 |
| 8637135 | Non-uniform semiconductor device active area pattern formation | Shao-Ming Yu | 2014-01-28 |
| 8623718 | Tilt implantation for forming FinFETs | Feng Yuan, Shao-Ming Yu, Clement Hsingjen Wann | 2014-01-07 |
| 8610240 | Integrated circuit with multi recessed shallow trench isolation | Chang-Yun Chang | 2013-12-17 |
| 8592918 | Forming inter-device STI regions and intra-device STI regions using different dielectric materials | Feng Yuan, Hung-Ming Chen, Chang-Yun Chang | 2013-11-26 |
| 8519481 | Voids in STI regions for forming bulk FinFETs | Feng Yuan, Hung-Ming Chen, Chang-Yun Chang | 2013-08-27 |
| 8507996 | Block contact plugs for MOS devices | Sey-Ping Sun, Chih-Hao Chang, Chao-An Jong, Chung-Ju Lee, Chin-Hsiang Lin | 2013-08-13 |
| 8497528 | Method for fabricating a strained structure | Chih-Hao Chang, Chih-Hsin Ko, Feng Yuan, Jeff J. Xu | 2013-07-30 |
| 8497201 | Self-assembly pattern for semiconductor integrated circuit | Clement Hsingjen Wann, Ching-Yu Chang | 2013-07-30 |
| 8445340 | Sacrificial offset protection film for a FinFET device | Feng Yuan, Chih Chieh Yeh | 2013-05-21 |
| 8373238 | FinFETs with multiple Fin heights | Chih Chieh Yeh, Chang-Yun Chang, Feng Yuan | 2013-02-12 |
| 8338305 | Multi-fin device by self-aligned castle fin formation | Hsin-Chih Chen, Feng Yuan | 2012-12-25 |
| 8174073 | Integrated circuit structures with multiple FinFETs | Chang-Yun Chang, Sheng-Da Liu, Fu-Liang Yang | 2012-05-08 |
| 8110466 | Cross OD FinFET patterning | Ming-Feng Shieh, Chang-Yun Chang | 2012-02-07 |
| 8048795 | Self-assembly pattern for semiconductor integrated circuit | Clement Hsingjen Wann, Ching-Yu Chang | 2011-11-01 |