Issued Patents All Time
Showing 26–50 of 74 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9589838 | Contact structure of semiconductor device | Sung-Li Wang, Ding-Kang Shih, Chin-Hsiang Lin, Clement Hsingjen Wann | 2017-03-07 |
| 9559182 | Self-aligned dual-metal silicide and germanide formation | Clement Hsingjen Wann, Ling-Yen Yeh, Chi-Yuan Shih, Li-Chi Yu, Chun Hsiung Tsai +6 more | 2017-01-31 |
| 9443769 | Wrap-around contact | Sung-Li Wang, Neng-Kuo Chen, Ding-Kang Shih, Meng-Chun Chang, Yi-An Lin +5 more | 2016-09-13 |
| 9443964 | Fin structure of FinFet | Gin-Chen Huang, Ching-Hong Jiang, Neng-Kuo Chen, Clement Hsingjen Wann | 2016-09-13 |
| 9416297 | Chemical mechanical polishing method using slurry composition containing N-oxide compound | Chia-Jung Hsu, Yun-Lung Ho, Neng-Kuo Chen, Wen-Feng Chueh, Song-Yuan Chang | 2016-08-16 |
| 9368446 | Self aligned contact formation | Neng-Kuo Chen, Shao-Ming Yu, Gin-Chen Huang, Chia-Jung Hsu, Clement Hsingjen Wann | 2016-06-14 |
| 9337103 | Method for removing hard mask oxide and making gate structure of semiconductor devices | Yi-An Lin, Chun-Wei Chang, Neng-Kuo Chen, Clement Hsingjen Wann | 2016-05-10 |
| 9263252 | Method of protecting an interlayer dielectric layer and structure formed thereby | Chun-Wei Chang, Yi-An Lin, Neng-Kuo Chen, Clement Hsingjen Wann, Yu-Lien Huang | 2016-02-16 |
| 9214556 | Self-aligned dual-metal silicide and germanide formation | Clement Hsingjen Wann, Ling-Yen Yeh, Chi-Yuan Shih, Li-Chi Yu, Chun Hsiung Tsai +6 more | 2015-12-15 |
| 9105490 | Contact structure of semiconductor device | Sung-Li Wang, Ding-Kang Shih, Chin-Hsiang Lin, Clement Hsingjen Wann | 2015-08-11 |
| 9099494 | Contact structure of semiconductor device | Sung-Li Wang, Ding-Kang Shih, Chin-Hsiang Lin, Clement Hsingjen Wann | 2015-08-04 |
| 9093530 | Fin structure of FinFET | Gin-Chen Huang, Ching-Hong Jiang, Neng-Kuo Chen, Clement Hsingjen Wann | 2015-07-28 |
| 9054194 | Non-planar transistors and methods of fabrication thereof | Chih-Hang Tung, Chin-Hsiang Lin, Cheng-Hung Chang | 2015-06-09 |
| 9034716 | Method of making a FinFET device | Sung-Li Wang, Chin-Hsiang Lin, Neng-Kuo Chen, Clement Hsingjen Wann | 2015-05-19 |
| 9006802 | Semiconductor device manufacturing methods and methods of forming insulating material layers | Gin-Chen Huang, Tsai-Fu Hsiao, Ching-Hong Jiang, Neng-Kuo Chen, Hongfa Luan +1 more | 2015-04-14 |
| 8969201 | Contact structure of semiconductor device priority claim | Sung-Li Wang, Ding-Kang Shih, Chin-Hsiang Lin, Clement Hsingjen Wann | 2015-03-03 |
| 8946828 | Semiconductor device having elevated structure and method of manufacturing the same | Tsung-Lin Lee, Chin-Hsiang Lin, Chih-Hao Chang, Chen-Nan Yeh, Chao-An Jong | 2015-02-03 |
| 8940597 | In-situ metal gate recess process for self-aligned contact application | Chia-Jung Hsu, Gin-Chen Huang, Yi-An Lin, Neng-Kuo Chen, Clement Hsingjen Wann | 2015-01-27 |
| 8921136 | Self aligned contact formation | Neng-Kuo Chen, Shao-Ming Yu, Gin-Chen Huang, Chia-Jung Hsu, Clement Hsingjen Wann | 2014-12-30 |
| 8853052 | Method of manufacturing a semiconductor device | Gin-Chen Huang, Yi-An Lin, Ching-Hong Jiang, Neng-Kuo Chen, Clement Hsingjen Wann | 2014-10-07 |
| 8823065 | Contact structure of semiconductor device | Sung-Li Wang, Ding-Kang Shih, Chin-Hsiang Lin, Clement Hsingjen Wann | 2014-09-02 |
| 8507996 | Block contact plugs for MOS devices | Chih-Hao Chang, Chao-An Jong, Tsung-Lin Lee, Chung-Ju Lee, Chin-Hsiang Lin | 2013-08-13 |
| 8497556 | Semiconductor devices with active semiconductor height variation | David E. Brown, Hans Van Meer | 2013-07-30 |
| 8263453 | Method for forming semiconductor devices with active silicon height variation | David E. Brown, Hans Van Meer | 2012-09-11 |
| 8124473 | Strain enhanced semiconductor devices and methods for their fabrication | James Pan, Andrew Waite | 2012-02-28 |