Issued Patents All Time
Showing 26–39 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9070534 | Ion beam dimension control for ion implantation process and apparatus, and advanced process control | Chih-Hong Hwang, Chun-Lin Chang, Chi-Ming Yang, Chin-Hsiang Lin | 2015-06-30 |
| 9048069 | Dosage accuracy monitoring systems of implanters | Juan Chen, Yung-Fu Yeh, Yuk-Tong Lee | 2015-06-02 |
| 9031684 | Multi-factor advanced process control method and system for integrated circuit fabrication | Chin-Hsiang Lin, Chi-Ming Yang, Chun-Lin Chang, Chih-Hong Hwang | 2015-05-12 |
| 9006676 | Apparatus for monitoring ion implantation | Chun-Lin Chang, Chih-Hong Hwang, Chi-Ming Yang, Chin-Hsiang Lin | 2015-04-14 |
| 8922122 | Ion implantation with charge and direction control | Chih-Hong Hwang, Chun-Lin Chang, Chi-Ming Yang, Chin-Hsiang Lin | 2014-12-30 |
| 8766207 | Beam monitoring device, method, and system | Chih-Hong Hwang, Chun-Lin Chang, Chi-Ming Yang, Chin-Hsiang Lin | 2014-07-01 |
| 8709528 | Wafer processing method and system using multi-zone chuck | Chi-Ming Yang, You-Hua Chou, Kuo-Sheng Chuang, Chin-Hsiang Lin | 2014-04-29 |
| 8592785 | Multi-ion beam implantation apparatus and method | Chin-Hsiang Lin, Chi-Ming Yang, Chun-Lin Chang, Chih-Hong Hwang | 2013-11-26 |
| 8581204 | Apparatus for monitoring ion implantation | Chun-Lin Chang, Chih-Hong Hwang, Chi-Ming Yang, Chin-Hsiang Lin | 2013-11-12 |
| 8241924 | Method and system for controlling an implantation process | Chyi Shyuan Chern | 2012-08-14 |
| 8212253 | Shallow junction formation and high dopant activation rate of MOS devices | Chun-Feng Nieh, Keh-Chiang Ku, Chi-Chun Chen, Li-Te Lin | 2012-07-03 |
| 8058134 | Junction profile engineering using staged thermal annealing | Li-Ting Wang, Keh-Chiang Ku, Yu-Chang Lin, Li-Ping Huang | 2011-11-15 |
| 8039375 | Shallow junction formation and high dopant activation rate of MOS devices | Chun-Feng Nieh, Keh-Chiang Ku, Chi-Chun Chen, Li-Te Lin | 2011-10-18 |
| 7385208 | Systems and methods for implant dosage control | Stock Chang, Wen-Yuh Peng | 2008-06-10 |