Issued Patents All Time
Showing 26–37 of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9990460 | Source beam optimization method for improving lithography printability | Shuo-Yen Chou, Ru-Gun Liu | 2018-06-05 |
| 9747408 | Generating final mask pattern by performing inverse beam technology process | Ru-Gun Liu, Shuo-Yen Chou, Tsai-Sheng Gau | 2017-08-29 |
| 9529959 | System and method for pattern correction in e-beam lithography | Hung-Chun Wang, Wen-Chun Huang, Ru-Gun Liu | 2016-12-27 |
| 8279409 | System and method for calibrating a lithography model | Abdurrahman Sezginer, Jesus Carrero, Tatung Chow, Kostyantyn Chuyeshov, Gokhan Percin | 2012-10-02 |
| 8122389 | Apparatus and method for segmenting edges for optical proximity correction | Abdurrahman Sezginer, Bayram Yenikaya | 2012-02-21 |
| 7743359 | Apparatus and method for photomask design | Abdurrahman Sezginer, Roy Prasad, Chi-Song Horng | 2010-06-22 |
| 7743358 | Apparatus and method for segmenting edges for optical proximity correction | Abdurrahman Sezginer, Bayram Yenikaya | 2010-06-22 |
| 7519940 | Apparatus and method for compensating a lithography projection tool | Abdurrahman Sezginer | 2009-04-14 |
| 7379170 | Apparatus and method for characterizing an image system in lithography projection tool | Abdurrahman Sezginer | 2008-05-27 |
| 7230704 | Diffracting, aperiodic targets for overlay metrology and method to detect gross overlay | Abdurrahman Sezginer, Kenneth C. Johnson | 2007-06-12 |
| 7230703 | Apparatus and method for measuring overlay by diffraction gratings | Abdurrahman Sezginer, Robert Shinagawa | 2007-06-12 |
| 7193715 | Measurement of overlay using diffraction gratings when overlay exceeds the grating period | Rodney Smedt, Abdurrahman Sezginer | 2007-03-20 |