Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12272556 | Method of manufacturing a semiconductor device with a work-function layer having a concentration of fluorine | Jung-Shiung Tsai, Chung-Chiang Wu, Wei-Fan Liao | 2025-04-08 |
| 12125876 | Semiconductor device and method | Kuan-Cheng Wang | 2024-10-22 |
| 12051614 | Isolation regions including two layers and method forming same | Tsung Han Hsu, Kuan-Cheng Wang, Shin-Yeu Tsai | 2024-07-30 |
| 11380549 | Semiconductor device with a work function layer having a concentration of fluorine | Jung-Shiung Tsai, Chung-Chiang Wu, Wei-Fan Liao | 2022-07-05 |
| 11031280 | Isolation regions including two layers and method forming same | Tsung Han Hsu, Kuan-Cheng Wang, Shin-Yeu Tsai | 2021-06-08 |
| 10978341 | Contact openings and methods forming same | Chih-Hung Sun, Yi-Wei Chiu, Kuan-Cheng Wang, Shin-Yeu Tsai, Jr-Yu Chen +1 more | 2021-04-13 |
| 10727066 | Semiconductor device and methods of manufacture | Jung-Shiung Tsai, Chung-Chiang Wu, Wei-Fan Liao | 2020-07-28 |
| 10510593 | Contact openings and methods forming same | Chih-Hung Sun, Yi-Wei Chiu, Kuan-Cheng Wang, Shin-Yeu Tsai, Jr-Yu Chen +1 more | 2019-12-17 |
| 10504734 | Semiconductor device and methods of manufacture | Jung-Shiung Tsai, Chung-Chiang Wu, Wei-Fan Liao | 2019-12-10 |
| 10269569 | Semiconductor device and methods of manufacture | Jung-Shiung Tsai, Chung-Chiang Wu, Wei-Fan Liao | 2019-04-23 |
| 9960074 | Integrated bi-layer STI deposition | Tsung Han Hsu, Kuan-Cheng Wang, Shin-Yeu Tsai | 2018-05-01 |
| 9881834 | Contact openings and methods forming same | Chih-Hung Sun, Yi-Wei Chiu, Kuan-Cheng Wang, Shin-Yeu Tsai, Jr-Yu Chen +1 more | 2018-01-30 |
| 9837267 | Optical filtering for integrated dielectrics UV curing processes | Kuan-Cheng Wang | 2017-12-05 |
| 9728402 | Flowable films and methods of forming flowable films | Kuan-Cheng Wang, Chun-Hao Hsu, Keng-Chu Lin | 2017-08-08 |
| 9379061 | High density dielectric etch-stop layer | Joung-Wei Liou, Keng-Chu Lin | 2016-06-28 |
| 9130022 | Method of back-end-of-line (BEOL) fabrication, and devices formed by the method | Shiauhan Wu, Joung-Wei Liou | 2015-09-08 |
| 9076845 | Method of forming a high density dielectric etch-stop layer | Joung-Wei Liou, Keng-Chu Lin | 2015-07-07 |
| 9059259 | Hard mask for back-end-of-line (BEOL) interconnect structure | Joung-Wei Liou, Keng-Chu Lin | 2015-06-16 |
| 9048268 | Method and equipment for removing photoresist residue after dry etch | Mu-Chen Chen, Yi-Tse Huang, Wei-Fan Liao, Chia-I Shen | 2015-06-02 |
| 6869836 | ILD stack with improved CMP results | Shwang-Ming Jeng, Shih-Ming Wang, Fu-Chi Hsu | 2005-03-22 |