Issued Patents All Time
Showing 26–50 of 57 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11545546 | Semiconductor device and method | Yu-Lien Huang, Guan-Ren Wang | 2023-01-03 |
| 11532712 | Interconnect structures for semiconductor devices and methods of manufacturing the same | Yu-Lien Huang, Guan-Ren Wang, Che-Ming Hsu | 2022-12-20 |
| 11515165 | Semiconductor device and method | Yu-Lien Huang, Guan-Ren Wang | 2022-11-29 |
| 11398385 | Semiconductor device and method | Yu-Lien Huang, Guan-Ren Wang | 2022-07-26 |
| 11380794 | Fin field-effect transistor device having contact plugs with re-entrant profile | Yu-Lien Huang, Guan-Ren Wang, Yun-Min Chang | 2022-07-05 |
| 11355399 | Gap patterning for metal-to-source/drain plugs in a semiconductor device | Yu-Lien Huang, Huan-Just Lin, Fu-Sheng Li, Tsai-Jung Ho, Bor Chiuan Hsieh +2 more | 2022-06-07 |
| 11355637 | Semiconductor device and method | Guan-Ren Wang, Yun-Min Chang, Yu-Lien Huang | 2022-06-07 |
| 11127837 | Method of forming MOSFET structure | Yu-Chan Yen, Chih-Hsin Ko, Chun-Hung Lee, Huan-Just Lin, Hui-Cheng Chang | 2021-09-21 |
| 10998228 | Self-aligned interconnect with protection layer | Yu-Chan Yen, Chia-Ying Lee | 2021-05-04 |
| 10930564 | Metal gate structure cutting process | I-Wen Wu, Chen-Ming Lee, Fu-Kai Yang, Mei-Yun Wang, Chang-Yun Chang +1 more | 2021-02-23 |
| 10879129 | Self-aligned nanowire formation using double patterning | De-Fang Chen, Yu-Chan Yen, Chia-Ying Lee, Chun-Hung Lee, Huan-Just Lin | 2020-12-29 |
| 10504792 | Self-aligned nanowire formation using double patterning | De-Fang Chen, Yu-Chan Yen, Chia-Ying Lee, Chun-Hung Lee, Huan-Just Lin | 2019-12-10 |
| 10461170 | Method of forming MOSFET structure | Yu-Chan Yen, Chih-Hsin Ko, Chun-Hung Lee, Huan-Just Lin, Hui-Cheng Chang | 2019-10-29 |
| 10276725 | Gate structure | De-Fang Chen, Chun-Hung Lee, Huan-Just Lin, Hui-Cheng Chang | 2019-04-30 |
| 10163723 | Self-aligned nanowire formation using double patterning | De-Fang Chen, Yu-Chan Yen, Chia-Ying Lee, Chun-Hung Lee, Huan-Just Lin | 2018-12-25 |
| 10050149 | Gate structure for semiconductor device | Yu-Lien Huang, Tsai-Chun Li, Ming-Huan Tsai, D.H. Tony Lee, Cheng-Hua Yang +1 more | 2018-08-14 |
| 9911661 | Nano wire structure and method for fabricating the same | De-Fang Chen, Yu-Chan Yen, Chia-Ying Lee, Chun-Hung Lee, Huan-Just Lin | 2018-03-06 |
| 9911805 | Silicon recess etch and epitaxial deposit for shallow trench isolation (STI) | Harry-Hak-Lay Chuang, Bao-Ru Young, Wei-Cheng Wu, Kong-Pin Chang, Chia Ming Liang +2 more | 2018-03-06 |
| 9831322 | Channel epitaxial regrowth flow (CRF) | Shih-Ting Hung, Hsin-Chih Chen, Chih-Hsin Ko, Clement Hsingjen Wann | 2017-11-28 |
| 9812536 | Reverse tone self-aligned contact | Yu-Chan Yen, Chia-Ying Lee | 2017-11-07 |
| 9741621 | Nano wire structure and method for fabricating the same | De-Fang Chen, Yu-Chan Yen, Chia-Ying Lee, Chun-Hung Lee, Huan-Just Lin | 2017-08-22 |
| 9633907 | Self-aligned nanowire formation using double patterning | De-Fang Chen, Yu-Chan Yen, Chia-Ying Lee, Chun-Hung Lee, Huan-Just Lin | 2017-04-25 |
| 9590090 | Method of forming channel of gate structure | De-Fang Chen, Chun-Hung Lee, Huan-Just Lin, Hui-Cheng Chang | 2017-03-07 |
| 9570358 | Nano wire structure and method for fabricating the same | De-Fang Chen, Yu-Chan Yen, Chia-Ying Lee, Chun-Hung Lee, Huan-Just Lin | 2017-02-14 |
| 9502533 | Silicon recess etch and epitaxial deposit for shallow trench isolation (STI) | Harry-Hak-Lay Chuang, Bao-Ru Young, Wei-Cheng Wu, Kong-Pin Chang, Chia Ming Liang +2 more | 2016-11-22 |