Issued Patents All Time
Showing 76–100 of 102 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11037924 | Method for forming source/drain contacts | Shao-Ming Koh, Fu-Kai Yang, Mei-Yun Wang | 2021-06-15 |
| 11018011 | Methods of forming contact features in semiconductor devices | Chen-Hung Tsai, Fu-Kai Yang, Mei-Yun Wang | 2021-05-25 |
| 10943818 | Semiconductor device and method | Chun-Han Chen, I-Wen Wu, Fu-Kai Yang, Mei-Yun Wang, Chung-Ting Ko +2 more | 2021-03-09 |
| 10943983 | Integrated circuits having protruding interconnect conductors | Chen-Hung Tsai, Fu-Kai Yang, Mei-Yun Wang | 2021-03-09 |
| 10930564 | Metal gate structure cutting process | I-Wen Wu, Fu-Kai Yang, Mei-Yun Wang, Chang-Yun Chang, Ching-Feng Fu +1 more | 2021-02-23 |
| 10872781 | Semiconductor device and a method for fabricating the same | Fu-Kai Yang, Mei-Yun Wang | 2020-12-22 |
| 10868118 | Methods of forming epitaxial source/drain features in semiconductor devices | Jia-Heng Wang, I-Wen Wu, Fu-Kai Yang, Mei-Yun Wang | 2020-12-15 |
| 10867846 | Fin field effect transistor (finFET) device structure with protection layer and method for forming the same | Chien-Yuan Chen, Fu-Kai Yang, Mei-Yun Wang | 2020-12-15 |
| 10854615 | FinFET having non-merging epitaxially grown source/drains | Chun Po Chang, Fu-Kai Yang, Mei-Yun Wang, Wei-Yang Lee, Tzu-Hsiang Hsu | 2020-12-01 |
| 10825737 | Prevention of contact bottom void in semiconductor fabrication | Yun Lee, Chung-Ting Ko, Mei-Yun Wang, Fu-Kai Yang | 2020-11-03 |
| 10797050 | Fin field effect transistor (finFET) device structure with capping layer and method for forming the same | Chun-Han Chen, Fu-Kai Yang, Mei-Yun Wang, Jr-Hung Li, Bo-Cyuan Lu | 2020-10-06 |
| 10741438 | Low-resistance contact plugs and method forming the same | Shao-Ming Koh, Fu-Kai Yang | 2020-08-11 |
| 10685880 | Methods for reducing contact depth variation in semiconductor fabrication | Yun Lee, Fu-Kai Yang, Yi-Jyun Huang, Sheng-Hsiung Wang, Mei-Yun Wang | 2020-06-16 |
| 10546755 | Semiconductor device and a method for fabricating the same | Fu-Kai Yang, Mei-Yun Wang | 2020-01-28 |
| 10504990 | Isolation features and methods of fabricating the same | I-Wen Wu, Fu-Kai Yang, Mei-Yun Wang, Jr-Hung Li, Bo-Cyuan Lu | 2019-12-10 |
| 10490459 | Method for source/drain contact formation in semiconductor devices | Shao-Ming Koh, I-Wen Wu, Fu-Kai Yang, Jia-Heng Wang, Mei-Yun Wang | 2019-11-26 |
| 10475788 | Fin field effect transistor (FinFET) device structure with capping layer and method for forming the same | Chun-Han Chen, Fu-Kai Yang, Mei-Yun Wang, Jr-Hung Li, Bo-Cyuan Lu | 2019-11-12 |
| 10177038 | Prevention of contact bottom void in semiconductor fabrication | Yun Lee, Chung-Ting Ko, Mei-Yun Wang, Fu-Kai Yang | 2019-01-08 |
| 10158018 | Semiconductor device and manufacturing method thereof | Liang Chen, Fu-Kai Yang, Mei-Yun Wang | 2018-12-18 |
| 10153198 | Low-resistance contact plugs and method forming same | Shao-Ming Koh, Fu-Kai Yang | 2018-12-11 |
| 10121675 | Semiconductor device and a method for fabricating the same | Fu-Kai Yang, Mei-Yun Wang | 2018-11-06 |
| 10096525 | Method for fabricating self-aligned contact in a semiconductor device | Fu-Kai Yang, Mei-Yun Wang, Kuo-Yi Chao | 2018-10-09 |
| 9685439 | Semiconductor device and manufacturing method thereof | Liang Chen, Fu-Kai Yang, Mei-Yun Wang | 2017-06-20 |
| 9647116 | Method for fabricating self-aligned contact in a semiconductor device | Fu-Kai Yang, Mei-Yun Wang, Kuo-Yi Chao | 2017-05-09 |
| 9520327 | Methods of forming low resistance contacts | Chun-Wen Nieh, Hung-Chang Hsu, Wei-Jung Lin, Yan-Ming Tsai, Mei-Yun Wang | 2016-12-13 |