Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12068191 | Low-resistance contact plugs and method forming same | Chen-Ming Lee, Fu-Kai Yang | 2024-08-20 |
| 12009363 | Method for forming source/drain contacts | Chen-Ming Lee, Fu-Kai Yang, Mei-Yun Wang | 2024-06-11 |
| 11532504 | Low-resistance contact plugs and method forming same | Chen-Ming Lee, Fu-Kai Yang | 2022-12-20 |
| 11217492 | Method for source/drain contact formation in semiconductor devices using common doping and common etching to n-type and p-type source/drains | Chen-Ming Lee, I-Wen Wu, Fu-Kai Yang, Jia-Heng Wang, Mei-Yun Wang | 2022-01-04 |
| 11145554 | Method for source/drain contact formation in semiconductor devices | Chen-Ming Lee, I-Wen Wu, Fu-Kai Yang, Jia-Heng Wang, Mei-Yun Wang | 2021-10-12 |
| 11037924 | Method for forming source/drain contacts | Chen-Ming Lee, Fu-Kai Yang, Mei-Yun Wang | 2021-06-15 |
| 10741438 | Low-resistance contact plugs and method forming the same | Chen-Ming Lee, Fu-Kai Yang | 2020-08-11 |
| 10490459 | Method for source/drain contact formation in semiconductor devices | Chen-Ming Lee, I-Wen Wu, Fu-Kai Yang, Jia-Heng Wang, Mei-Yun Wang | 2019-11-26 |
| 10153198 | Low-resistance contact plugs and method forming same | Chen-Ming Lee, Fu-Kai Yang | 2018-12-11 |
| 9660075 | Integrated circuits with dual silicide contacts and methods for fabricating same | Guillaume Bouche, Jeremy A. Wahl, Andy Wei | 2017-05-23 |
| 9490340 | Methods of forming nanowire devices with doped extension regions and the resulting devices | Guillaume Bouche, Jing Wan, Andy Wei | 2016-11-08 |
| 9431512 | Methods of forming nanowire devices with spacers and the resulting devices | Guillaume Bouche, Jing Wan, Andy Wei | 2016-08-30 |
| 9306019 | Integrated circuits with nanowires and methods of manufacturing the same | Jing Wan, Guillaume Bouche, Andy Wei | 2016-04-05 |
| 9293462 | Integrated circuits with dual silicide contacts and methods for fabricating same | Guillaume Bouche, Jeremy A. Wahl, Andy Wei | 2016-03-22 |
| 9196694 | Integrated circuits with dual silicide contacts and methods for fabricating same | Guillaume Bouche, Jeremy A. Wahl, Andy Wei | 2015-11-24 |
| 9196710 | Integrated circuits with relaxed silicon / germanium fins | Andy Wei, Jin Ping Liu, Amaury Gendron | 2015-11-24 |
| 9177805 | Integrated circuits with metal-insulator-semiconductor (MIS) contact structures and methods for fabricating same | Guillaume Bouche, Jeremy A. Wahl, Andy Wei | 2015-11-03 |
| 9117842 | Methods of forming contacts to source/drain regions of FinFET devices | Andy Wei | 2015-08-25 |